t210.gif (2725 ×Ö½Ú)

Non-Crystalline Nano-Carbon Films Fabricated under Low Temperature
Deng Ning,Zhu Changchun
(Xi'an Jiaotong University,Xi'an 710049,China)

zwb.gif (1647 ×Ö½Ú)retue.gif (1614 ×Ö½Ú)
Abstract: Non-crystalline nano-carbon films are coated on (100) n-Si substrate by using the plasma enhanced chemical vapor deposition (PECVD) method at a temperature420K.The film consists of carbon grain size of 90~100nm. Roman spectrum shows that the main component is non-crystalline carbon withSP2 bond.The measurements at different areas show good field emission characteristics and niformity. The threshold field is very low(about4MV/m). The current density of 0.016A per square centimeter was obtained under an electric field of 7WV/m. The effective work function of 0.65eV was calculated by an iterative method. And the emission spot density was estimated to be about 60 000per square centimeter.
Keywords: field emission;non-crystalline carbon;emission spot density