Emission Characteristics of Polycrystalline Diamond Film by N Ion Implantation
Deng Ning,Zhu Changchun
(Xi'an Jiaotong University , Xi'an 710049 , China)

Abstract: The field emission characteristics of polycrystalline diamond film can be improved using N ion implantation. The emission characteristics after ion implantation were compared with those before impl antation. It is found that obvious differences were found on threshold field and emission current density even for samples fabricated under the same process. These differences were eliminated by N ion implantation. Emission current density in creases under high field. The mechanism of the improvement was analyzed theoretically. Ion implantation and annealing affect the distribution of defect energy levels. This is due to the absorption of defects by the substrate/diamond interface.
Keywords: ion implantation;field emission;diamond film