| Vol.38 No.2 | Journal of Xi'an Jiaotong University |
Feb.2004 |
| Effect of Si4+-Doping
on the Structure and Decomposition Behavior of Nanocrystalline Mg£¬Al-Hydrotalcite Ren Qingli1,Chen Shoutian1,Wu Hongcai2 (1.School of Electrical Engineering,Xi'an Jiaotong University,Xi'an 710049,China;2. School of Electronics and Information Engineering,Xi'an Jiaotong University,Xi'an 710049,China) Abstract:By taking NaAlO2 as the aluminum resource£¬the Mg£¬Al-hydrotalcite flameª²retardant agent samples with/without Si4+doping were successfully prepared by the oneª²step liquid reaction method at atmospheric pressure£®The effect of Si4+concentration on the structure and nucleation of nanocrystalline Si4+doped Mg£¬Alª²hydrotalcite is discussed according to the results of XRD£® Based on the results of IR£¬it is recognized that Si4+can enter the hydroxyl £¨OH-£© octahedral structure space of the positive charged basic layer£ÛMg6Al2£¨OH£©16]2+ of Mg£¬Alª²hydrotalcite£®Moreover£¬the color of the nanocrystalline Mg£¬Al-hydrotalcite was changed from white to blue after doping Si4+.Besides£¬ after Si4+-doping£¬the crystal growth of Mg£¬Al-hydrotalcite is restrained£¬which is decreased from 350 nm for the sample without Si4+doping to 100 nm for the sample with Si4+doping£» its thermal decomposition temperature range is widened from 170.9~442ª±4 ¡æ to 170.1~468.5 ¡æ£»and the residual amount is increased from 56.1% to 61.6%%.Accordingly,thermal stability property of Mg£¬Al-hydrotalcite be optimized by doping Si4+£® Keywords:Mg£¬Al-hydrotalcite£»nanocrystalline£»Si4+-doping |
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