| 第36卷 第6期 | 西 安 交 通 大 学 学 报 | Vol.36 No6 |
| 2002年6月 | Journal of Xi'an Jiaotong Universtity |
Jun 2002 |
Investigation on Passivating Silicon Nitride Surface of Crystalline
Silicon Solar Cells
Yang Hong1,Wang He1,Yu
Huacong2,Xi Jianping2,Hu Hongxun2,Chen
Guangde1
(1.School of Sciences,Xi'an Jiaotong University,Xi'an 710049,China;
2.Institute of Solar Energy,Shanghai Jiaotong University)
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Abstract:In order to improve photoelectric conversion efficiency of
crystalline silicon solar cells,some effects of surface passivation quality and
antireflection properties of silicon nitride prepared by plasma enhanced chemical vapour
deposition on crystalline silicon solar cells are investigated. All kinds of crystalline
silicon solar cells were prepared by different process methods. It was found that the
silicon nitride/silicon oxide double layer optical antireflection coatings structure shows
excellent passivation properties for crystalline solar cells compared to silicon nitride,
so photoelectric conversion efficiency of crystalline silicon solar cells is enhanced.
Based on interface physics, a new energy band model of silicon nitride/silicon
oxide/silicon is presented, differences of efficiency of crystalline silicon solar cells
prepared by different methodes are explained by this model.
Keywords:solar cells;surface passivation;silicon nitride;plasma
enhanced chemical vapour deposition